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We investigate fundamental and applied aspects of quantum nanodevices based on new materials as graphene and 2D related materials, topological insulators and III-V semiconductor heterostructures. Our clean room includes state-of-the art nanolithography tools to process graphene and semiconductor based nanodevices down to sizes of 20 nm. Other deposition technologies such as Langmuir-Blodgett can be used to prepare thin films of new materials.

1. DEPOSIT OF FILMS AND NANOMATERIALS (PDF)
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Nanolithography and SEM Microscopy

FE-­‐SEM (Sigma Zeiss)+Raith Elphy plus
(Resolution < 2nm )

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Deep UV Lithography

MJB4 –Karl Suss mask aligner
(Resolution 500 nm)

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Spin Coating

LabSpin6 Karl Suss
Max speed: 6000 rpm

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E-Beam Metal thin-film Evaporator

Au, Ti, Al, etc
High Vacuum 10-­‐10 mbar ; Low
Deposition rate <0,1 nm/nm/s
(resolution 1 nm)

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Rapid Thermal Process (RTP)

AS-ONE
Up to 1500 0C
Max ramp 200 0C/s
High vacuum, air, O2,N2, He, Ar…

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Optical Microscope

Leica DM8000
Objectives: 5x,10x,20x,50x,100x
Resolution 1 micron

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Stylus Profiler

Dektak XT Brucker
Line profile and 3D topographical maps
Resolution < 1nm

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O2 Plasma Cleaner

Harrick Plasma
Graphene and carbon nanomaterials
etching and wafer cleanning

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Critical point Dryer

Leica EM CPD030

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Chemical cabinet

Wet etching process with different acids:
HF, HCl, H2SO4,BOE etc.
Equipped with: Milli-­‐Q for ultrapure water (Type 1, ISO 3696)
Hot plate with magnetic stirrer Microbalance and Ultrasonic bath

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Reactive Ion Etching/Induced Coupled Plasma (RIE/ICP)

PlasmaPro System 100/1 Cobra 300 Oxford Instruments
Dry etching of many materials
(semiconductors, metals, dielectrics)
Gas lines (Cl2, BCl3, Ar, He, N2, SF6, C4F8, O2, CH4, H2);
Cyro-etching Aspect ratio > 100 at 10 nm scale.

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Micro Diamond Scriber MR-100
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Semi­ Automatic Wire Bonder

TPT HB10
Top wire bonding of micro a nano electronic devices.

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Langmuir-Blodgett (KSV2000 System 2)

To Fabricate and characterize monomolecular films with precise control of lateral packing density

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Brewster Angle Microscopy (Optrel BAM 3000)

Visualization of Langmuir monolayers or adsorbate films at the air-water interface

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Kelvin probe (KSV SPOT1)

It allows determining Composition, Dissociation degree, Orientation and Interaction in Langmuir monolayers

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Quartz CrystalMicrobalance (Q-sense E1)

Mass changes and interactions occurring at surfaces.
Surface rheology of surface bound materials.

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