We investigate fundamental and applied aspects of quantum nanodevices based on new materials as graphene and 2D related materials, topological insulators and III-V semiconductor heterostructures. Our clean room includes state-of-the art nanolithography tools to process graphene and semiconductor based nanodevices down to sizes of 20 nm. Other deposition technologies such as Langmuir-Blodgett can be used to prepare thin films of new materials.
Nanolithography and SEM Microscopy
FE-‐SEM (Sigma Zeiss)+Raith Elphy plus
(Resolution < 2nm )
Deep UV Lithography
MJB4 –Karl Suss mask aligner
(Resolution 500 nm)
Spin Coating
LabSpin6 Karl Suss
Max speed: 6000 rpm
E-Beam Metal thin-film Evaporator
Au, Ti, Al, etc
High Vacuum 10-‐10 mbar ; Low
Deposition rate <0,1 nm/nm/s
(resolution 1 nm)
Rapid Thermal Process (RTP)
AS-ONE
Up to 1500 0C
Max ramp 200 0C/s
High vacuum, air, O2,N2, He, Ar…
Optical Microscope
Leica DM8000
Objectives: 5x,10x,20x,50x,100x
Resolution 1 micron
Stylus Profiler
Dektak XT Brucker
Line profile and 3D topographical maps
Resolution < 1nm
O2 Plasma Cleaner
Harrick Plasma
Graphene and carbon nanomaterials
etching and wafer cleanning
Critical point Dryer
Leica EM CPD030
Chemical cabinet
Wet etching process with different acids:
HF, HCl, H2SO4,BOE etc.
Equipped with: Milli-‐Q for ultrapure water (Type 1, ISO 3696)
Hot plate with magnetic stirrer Microbalance and Ultrasonic bath
Reactive Ion Etching/Induced Coupled Plasma (RIE/ICP)
PlasmaPro System 100/1 Cobra 300 Oxford Instruments
Dry etching of many materials
(semiconductors, metals, dielectrics)
Gas lines (Cl2, BCl3, Ar, He, N2, SF6, C4F8, O2, CH4, H2);
Cyro-etching Aspect ratio > 100 at 10 nm scale.
Micro Diamond Scriber MR-100
Semi Automatic Wire Bonder
TPT HB10
Top wire bonding of micro a nano electronic devices.
Langmuir-Blodgett (KSV2000 System 2)
To Fabricate and characterize monomolecular films with precise control of lateral packing density
Brewster Angle Microscopy (Optrel BAM 3000)
Visualization of Langmuir monolayers or adsorbate films at the air-water interface
Kelvin probe (KSV SPOT1)
It allows determining Composition, Dissociation degree, Orientation and Interaction in Langmuir monolayers
Quartz CrystalMicrobalance (Q-sense E1)
Mass changes and interactions occurring at surfaces.
Surface rheology of surface bound materials.